There are hundreds of process steps in semiconductor industry.
Among that, we have been especially dedicating to the continuous atmospheric pressure chemical vapor deposition (APCVD).
Since founded in April 1962, we have ever confronted big waves that historically go through boom-and-burst cycles in the semiconductor related marketplace, but we have been growing step by step with customers' patronage as well as guidance
for which all of us appreciate very much.
Though it is prodigious technology innovation nowadays, we respect a principle and grapple with technical skill-up as well as quality everyday with motto of "lnventiveness+devise= leadingedge technology". We believe that it attributes to the superior quality of APCVD, which is satisfactory to customers. An abundance of talented, dedicated employees continue to provide quick and high quality service. Appreciating your continuous patronage and support.

Kentaro Yoshioka, President