AMAYA CO., LTD.


AMAX1000s

High Throughput APCVD System

AMAX1000s appearance


Features Wafer size: □125 - □156mm
Throughput: >1000 Wafers per hour
Temperature: 400 to 450 degC
Type of film: Undoped SiO2, Doped SiO2(PSG, BSG)
System dimensions: 1,800mm(W) x 5,000mm(L) x 2,000mm(H)
　
Application

- Passivation
- Diffusion Barrier Layer
- Doping Layer

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