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Dseries
(D301)
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Single Wafer Atmospheric Pressure CVD System
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Various special specifications
available upon request.
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The number of chambers installed and wafer size) |
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Dual-chamber system
CHAMBER-1 CVD chamber (max. 800°C)
CHAMBER-2 Chamber for high-temperature treatment (1000°C)
System dimensions (main unit)
2,200mm (W) x 1,200mm (D) x 2,000mm(H)
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D301 appearance
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| Features |
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Adopted
with the direct vent type chamber, which ensures reproducibility
and safety
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Multiple
wafer-size-capable CVD system, max. φ150-mm wafers
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Various
process controls enabled with recipe setting from the touch panel.
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| Increased
durability and temperature uniformity of±1°C assured
with the utilization of the C/C composite heater. |
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