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| Metal
Organic Chemical Vapor Deposition
(MOCVD) |
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MOCVD
SYSTEM Doctor T
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Mass
production of FeRAM-LSI has been realized
by using our newly produced system developed
by industry-university co-operation.
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MOCVD system has accomplished an epoch-making
mass production mechanism of FeRAM-LSI by continous research on
film deposition of ferroelectrics such as PZT(Lead Zirconate Titanate)
, SBT(Strontium Bismuth Tantalete), which has been difficult to
do by the usual CVD mechanism.
MOCVD system is sure to make a marvelous development in production
of the next generation FeRAM-LSI. Also, this system is applicable
to a far broader field including FeRAM because this system is able
to perform film deposition of metal oxides of various compositions
as well as that of electrode metal and PZT/SBT. |
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For the first time in the world, WACOM
Electric Co., Ltd. (currently WACOM Research and Development, the
president being Masaki Kusuhara) has accomplished the MOCVD system
intended for ferroelectrics thin film deposition for mass production
of FeRAM. (Distributor is M. Watanabe & Co., Ltd.)
For realization of this completely new MOCVD system, WACOM R and
D and Dr. Toda of YamagataUniversity, under assistance of M. Watanabe
& Co., Lted., worked together to develop a unique mechanism
which was not found in the usual CVD system.
Details of this new mechanism were reported at the domestic and
foreign Applied Physics Societies and ISIF* to be highly evaluated. |
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ISIF
- International Symposium on Integrated Ferroelectrics
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| A remarkable property of this system
is the high quality liquid supplying system and evaporation system
(both internationally patented). Adoption of the high quality liquid
supplying system resulted in a minimized dead space and automatic
cleaning system. By this evaporation system, with its particular
structure, the material liquid is efficiently evaporated, which
prevents a nozzle from clogging up and enables continuous operation.
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