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PRODUCTS

Continuous APCVD for 12 inch wafers

AMAX1200

  • 51 WPH @ 12 inch wafers
  • Metal addition Free design and Long Term Stable Process with SiC Tray

Feature

  • 12 inch wafer Continuous APCVD system, based on long term AMAX Series.
  • Developped wider area deposition dispersion head and minimize the number of trays to reduce the cost of system.
  • SiC Trays as susceptors prevent heavy metal addition and help long term stable process for long term production.
  • Good maintenability and Operators safety are given by automated head base liftting system and automated tray exchange system, that shorten PM time for longer use of system

Performance

Film Thickness Nu ≦±3.0%
Wafer Size 12 inch
Gas SiH4, O2, PH3, B2H6, N2
Deposition Temp. ~450℃
Productivity 51WPH

Specifictions

System Size 21650㎜(W) x 4788㎜(D) x 2250㎜(H)
Heaters Heater Coils
Loader/Unloader Robot Cassette to Cassette Transfer
Dispersion Head (Gas Nozzle) A63 Dispersion Head

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